Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Dual metric OPC

Dual metric OPC

US Patent 8084169 · Granted Dec 27, 2011

Estimated economic value: $3,972,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for rule-based retargeting of target pattern2025
Curvilinear mask models2020
Model-based generation of dummy features2019
Methodology for model-based self-aligned via awareness in optical proximity corr2019
Methods for modifying an integrated circuit layout design2017
Model-based generation of dummy features2017
Method and system for via retargeting2017
Methods for retargeting circuit design layouts and for fabricating semiconductor2016
Methods for retargeting vias and for fabricating semiconductor devices with reta2016
Methods for modifying an integrated circuit layout design2016
Methods for modifying an integrated circuit layout design2015
Process enhancing safe SRAF printing using etch aware print avoidance2014