Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of forming low capacitance ESD device and structure therefor

Method of forming low capacitance ESD device and structure therefor

US Patent 8039359 · Granted Oct 18, 2011

Estimated economic value: $20,747,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of preparing programmable diode, programmable diode and ferroelectric mem2025
Memristor, method of calculating hamming distance, and in-memory computing integ2025
Pressure sensor based on zinc oxide nanowires and method of manufacturing pressu2025
All-electrically-controlled spintronic neuron device, neuron circuit and neural 2025
Memory cell structure, memory array structure, and voltage biasing method2025
Defect reduction of semiconductor layers and semiconductor devices by anneal and2025
Fan-out wafer level packaging of semiconductor devices2025
Backside ohmic contacts for semiconductor devices2025
Oxidation and corrosion prevention in semiconductor devices and semiconductor de2024
Methods of manufacture for trench-gate insulated-gate bipolar transistors (IGBTs2023
High-electron-mobility transistor (HEMT) semiconductor devices with reduced dyna2022
Remote contacts for a trench semiconductor device and methods of manufacturing s2022