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Home › System, method and apparatus for filament and support used in plasma-enhanced chemical vapor deposition for reducing carbon voids on media disks in disk drives

System, method and apparatus for filament and support used in plasma-enhanced chemical vapor deposition for reducing carbon voids on media disks in disk drives

US Patent 8028653 · Granted Oct 4, 2011

Estimated economic value: $96,000 ⓘ

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