Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process for making and designing an IC with pattern controlled layout regions

Process for making and designing an IC with pattern controlled layout regions

US Patent 8004315 · Granted Aug 23, 2011

Estimated economic value: $1,302,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Device and method for detecting faulty electrical circuits with fault identifica2025
Automatic collateral exchange for rehypothecated collateral2024
Integrated circuit having high pattern regularity2013
Pattern controlled IC layout2011