Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System and method for reducing particles and contamination by matching beam complementary aperture shapes to beam shapes

System and method for reducing particles and contamination by matching beam complementary aperture shapes to beam shapes

US Patent 7977628 · Granted Jul 12, 2011

Estimated economic value: $3,014,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Power coupling device2025
Scanning systems with dynamically adjustable shielding systems and related metho2023
Power coupling device2023
Wheel and lift unit for radiation imaging modalities2022
System and method for sampling frequency adjustment for radiation imaging system2022
Scanning systems with dynamically adjustable shielding systems and related metho2021
Multiple three-dimensional (3-D) inspection renderings2020
Power generation for radiation system2019
X-ray inspection system X-ray radiation shielding curtains2019
Ion implanter having combined hybrid and double mechanical scan architecture2012
Methods for implanting B22Hx and its ionized lower mass byproducts2010
Ion implanter having combined hybrid and double mechanical scan architecture2009