Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Photolithographic method and mask devices utilized for multiple exposures in the field of a feature

Photolithographic method and mask devices utilized for multiple exposures in the field of a feature

US Patent 7919231 · Granted Apr 5, 2011

Estimated economic value: $209,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Automated inspection measurement in garment manufacturing2023
Method for making a current-perpendicular-to-the-plane (CPP) magnetoresistive (M2016
Current-perpendicular-to-the-plane (CPP) magnetoresistive sensor with reduced-wi2015
Photolithographic method and mask devices utilized for multiple exposures in the2012
Photolithographic method and mask devices utilized for multiple exposures in the2012
Photolithographic method and mask devices utilized for multiple exposures in the2012
Photolithographic method and mask devices utilized for multiple exposures in the2012
Advanced phase shift lithography and attenuated phase shift mask for narrow trac2012
Current perpendicular to plane differential magnetoresistance read head design u2011
Test components fabricated with pseudo sensors used for determining the resistan2011
Test components fabricated with large area sensors used for determining the resi2010
High-resolution, patterned-media master mask2010