Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Scatterometry metrology using inelastic scattering

Scatterometry metrology using inelastic scattering

US Patent 7903260 · Granted Mar 8, 2011

Estimated economic value: $13,284,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Configuration parameter management for non-volatile data storage2019
Systems and methods for managing storage endurance2019
System and method for rejuvenating an imaging sensor degraded by exposure to ext2018
Configuration parameter management for non-volatile data storage2017
Systems and methods for managing storage endurance2017
System and method for apodization in a semiconductor device inspection system2017
System and method for apodization in a semiconductor device inspection system2015
Crucible weight measurement system for controlling feedstock introduction in Czo2012
Systems and methods for measurement of a specimen with vacuum ultraviolet light2010
Scatterometry metrology using inelastic scattering2010
Systems and methods for measurement of a specimen with vacuum ultraviolet light2009
Dynamic measurement control2009