Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process for preparing CaF2 lens blanks especially for 193 nm and 157 nm lithography with minimized deffects

Process for preparing CaF2 lens blanks especially for 193 nm and 157 nm lithography with minimized deffects

US Patent 7883578 · Granted Feb 8, 2011

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Structured plate-like glass element and process for the production thereof2025
Structured plate-like glass element and process for the production thereof2024
Structured plate-like glass element and process for the production thereof2021
Projection display and method of displaying an overall picture2014
Projection display having kohler illumination of projection lenses2014
Scintillation materials of low oxygen content and process for producing same2014
Method for making low-stress large-volume crystals with reduced stress birefring2011
Arrangement and method for preventing the depolarization of linear-polarized lig2011
Method and apparatus for making a highly uniform low-stress single crystal by dr2011
Method of making large-volume CaF2 single crystals for optical elements with an 2010
Method of testing optical materials by irradiating with high energy density radi2010
Method of determining laser stabilities of optical materials, crystals selected 2010