Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for detecting lithographically significant defects on reticles

Method for detecting lithographically significant defects on reticles

US Patent 7873204 · Granted Jan 18, 2011

Estimated economic value: $13,584,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Wafer inspection using difference images2022
Block-to-block reticle inspection2020
Inspection of photomasks by comparing two photomasks2019
Monitoring changes in photomask defectivity2018
Monitoring changes in photomask defectivity2018
Delta die and delta database inspection2017
Integrated multi-pass inspection2017
Block-to-block reticle inspection2017
Method and apparatus for database-assisted requalification reticle inspection2017
Monitoring changes in photomask defectivity2016
Monitoring changes in photomask defectivity2016
Detection of thin lines for selective sensitivity during reticle inspection usin2015