Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Localized masking for semiconductor structure development

Localized masking for semiconductor structure development

US Patent 7868369 · Granted Jan 11, 2011

Estimated economic value: $3,670,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods of treating semiconductor substrates, methods of forming openings during2015
Compositions for use in semiconductor devices2015
Compositions for use in semiconductor devices2014
System having improved surface planarity for bit material deposition2013
Methods of treating semiconductor substrates, methods of forming openings during2013
Wafer cleaning with immersed stream or spray nozzle2013
Compositions for dissolution of low-k dielectric films, and methods of use2012
Methods for enhancing capacitors having roughened features to increase charge-st2011
Methods of fabricating integrated circuitry2010
Process for fabricating films of uniform properties on semiconductor devices2010
Method for enhancing electrode surface area in DRAM cell capacitors2010
Method for enhancing electrode surface area in DRAM cell capacitors2010