Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Film thickness prediction method, layout design method, mask pattern design method of exposure mask, and fabrication method of semiconductor integrated circuit

Film thickness prediction method, layout design method, mask pattern design method of exposure mask, and fabrication method of semiconductor integrated circuit

US Patent 7851236 · Granted Dec 14, 2010

Estimated economic value: $345,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Backside illumination type solid-state imaging device, manufacturing method for 2025
Backside-illumination solid-state image pickup apparatus, image pickup apparatus2025
Solid state imaging device, solid state imaging device manufacturing method, and2024
Packaging apparatus2024
Electrode structure, liquid crystal display device, projective display device, a2024
Pinhole camera, electronic apparatus and manufacturing method2024
Camera module, method of manufacturing the same, and electronic apparatus2023
Short-arc discharge lamp2021
Pinhole camera, electronic apparatus and manufacturing method2021
Display device, method for producing display device, and display apparatus of pr2021
Light control device, imaging element, and imaging device, and light transmittan2021
Liquid crystal display unit and projection display unit2020