Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Extreme ultraviolet photolithography mask, with resonant barrier layer

Extreme ultraviolet photolithography mask, with resonant barrier layer

US Patent 7842438 · Granted Nov 30, 2010

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Device for detecting objects by holography2023
Method for projecting a beam of particles onto a substrate with correction of sc2021
Electrostatic lens having a dielectric semiconducting membrane2018
Resolution test chart for X-ray imaging system and method of fabrication2017
Method for producing a three-dimensionally controlled surface coating in a cavit2014
Method for making a planar membrane2013
Extreme ultraviolet photolithography mask, with absorbent cavities2010