Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of forming a carbon nano-material layer using a cyclic deposition technique

Method of forming a carbon nano-material layer using a cyclic deposition technique

US Patent 7833580 · Granted Nov 16, 2010

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Light irradiation method and light irradiation apparatus2019
Semiconductor device2018
Semiconductor device2018
Semiconductor device, method for fabricating the same, and memory system includi2017
Semiconductor device2017
Apparatus including 4-way valve for fabricating semiconductor device, method of 2017
Apparatus including 4-way valve for fabricating semiconductor device, method of 2017
Method for operating semiconductor manufacturing equipment2017
Methods of manufacturing semiconductor devices2017
Semiconductor device and method for fabricating the same2017
Methods of forming semiconductor devices, including performing a heat treatment 2016
Apparatus including 4-way valve for fabricating semiconductor device, method of 2016