Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for forming a pattern on a semiconductor device using an organic hard mask

Method for forming a pattern on a semiconductor device using an organic hard mask

US Patent 7776515 · Granted Aug 17, 2010

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Photoresist coating composition and method for forming fine contact of semicondu2012
Method for forming a fine pattern in a semicondutor device2011
Method for forming fine pattern of semiconductor device2011
Method for forming a fine pattern of a semiconductor device2011
Method for manufacturing a semiconductor device2010
Method for forming a fine pattern of a semiconductor device2010
Method for manufacturing semiconductor device2010
Method for manufacturing a semiconductor device2010
Method of forming fine pattern of semiconductor device2010
Anti-reflective polymer, anti-reflective composition containing the same, and me2010
Anti-reflective polymer, anti-reflective composition containing the same, and me2010
Method for forming fine pattern of semiconductor device2010