Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for detecting endpoint in a dry etching system by monitoring a superimposed DC current

Method and apparatus for detecting endpoint in a dry etching system by monitoring a superimposed DC current

US Patent 7754615 · Granted Jul 13, 2010

Estimated economic value: $6,420,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Tactile smart watch for visually impaired2025
Electric pressure systems for control of plasma properties and uniformity2023
Technologies for lockless, scalable, and adaptive storage quality of service2021
Method and arrangement for wastewater treatment2020
Microwave plasma device2020
Mono-energetic neutral beam activated chemical processing system and method of u2020
Garbage collection of a storage device2020
Method and apparatus for bio-electrically generating power from organic ingredie2020
Asynchronous discovery of initiators and targets in a storage fabric2020
Self-sustained non-ambipolar direct current (DC) plasma at low power2019
Non-ambipolar electric pressure plasma uniformity control2019
Low electron temperature, edge-density enhanced, surface-wave plasma (SWP) proce2019