Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for reliably removing excess metal during metal silicide formation

Method for reliably removing excess metal during metal silicide formation

US Patent 7700481 · Granted Apr 20, 2010

Estimated economic value: $10,232,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System and method for monitoring ultraviolet radiation bioremediation2025
System and method for operating an engine with reduced NOx emissions2022
Variable implant and wafer-level feed-forward for dopant dose optimization2022
Authentication article and process for making same2018
Surface properties of polymeric materials with nanoscale functional coating2015
Method to attain low defectivity fully silicided gates2012
FUSI integration method using SOG as a sacrificial planarization layer2011
FUSI integration method using SOG as a sacrificial planarization layer2010
FUSI integration method using SOG as a sacrificial planarization layer2010
Method for cleaning post-etch noble metal residues2010
Method of manufacturing metal silicide contacts2010
Code division multiple access enhanced capacity system2009