Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Reflection mask for EUV photolithography and method of fabricating the reflection mask

Reflection mask for EUV photolithography and method of fabricating the reflection mask

US Patent 7682758 · Granted Mar 23, 2010

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Anti-reflective optical coatings and methods of forming the same2025
POD cleaning device2025
Unit pixel of image sensor and light-receiving element thereof2025
Comb2025
Pod cleaning process2025
Pod cleaning chamber2025
Plasmonic field-enhanced photodetector and image sensor2025
Crime type inference system and method based on text data2024
Methods for making high density vias in a glass article2024
Unit cell of display panel including integrated TFT photodetector2024
Camera module comprising a liquid lens and performing optical image stabilizatio2024
Curved surface films and methods of manufacturing the same2024