Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors

Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors

US Patent 7671001 · Granted Mar 2, 2010

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Stripping and cleaning compositions for microelectronics2011
Stabilized alkaline compositions for cleaning microelectronic substrates2003
Stabilized alkaline compositions for cleaning microelectronic substrates2003
Silicate-containing alkaline compositions for cleaning microelectronic substrate2002
Cleaning wafer substrates of metal contamination while maintaining wafer smoothn1999