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Home › In-situ co-deposition of Si in diffusion barrier material depositions with improved wettability, barrier efficiency, and device reliability

In-situ co-deposition of Si in diffusion barrier material depositions with improved wettability, barrier efficiency, and device reliability

US Patent 7655555 · Granted Feb 2, 2010

Estimated economic value: $11,818,000 ⓘ

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