Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of forming low-k dielectrics using a rapid curing process

Method of forming low-k dielectrics using a rapid curing process

US Patent 7622399 · Granted Nov 24, 2009

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Cationic gettering in liquid crystal NCAP and PDLC films2025
Method of treatment of biological surfaces2025
Method for fabricating a liquid-crystal-based electro-optical light modulator us2025
Method of enhancing the antimicrobial action of systemically administered antibi2024
Polysiloxane compositions and uses thereof2024
Enhanced defect detection with planar macrocycle dyes in liquid-crystal films2024
Dielectric siloxane particle films and devices having the same2023
Electrically conductive siloxane particle films, and devices with the same2022
LED structure and luminaire for continuous disinfection2022
Transparent siloxane encapsulant and adhesive2021
Method of making a siloxane polymer composition2021
Siloxane monomers, their polymerization and uses thereof2021