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Home › Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers

Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers

US Patent 7608382 · Granted Oct 27, 2009

Estimated economic value: $16,602,000 ⓘ

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