Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › High-purity ferromagnetic sputter targets and method of manufacture

High-purity ferromagnetic sputter targets and method of manufacture

US Patent 7608172 · Granted Oct 27, 2009

Estimated economic value: $162,535,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for forming sputter target assemblies having a controlled solder thicknes2015
Method for forming sputter target assemblies having a controlled solder thicknes2015
Method for forming sputter target assemblies having a controlled solder thicknes2013
Method for forming sputter target assemblies having a controlled solder thicknes2013
Method for forming sputter target assemblies2012
Method for forming sputter target assemblies2012
Method for forming sputter target assemblies2012
Ultrafine-grain-copper-base sputter targets2011
Controlled-grain-precious metal sputter targets2010
High-purity aluminum sputter targets and method of manufacture2008
High-purity aluminum sputter targets and method of manufacture2008
Controlled-grain-precious metal sputter targets2007