Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process for depositing thin layers on a substrate in a process chamber of adjustable height

Process for depositing thin layers on a substrate in a process chamber of adjustable height

US Patent 7524532 · Granted Apr 28, 2009

Estimated economic value: $698,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for compaction detection and control when compacting a soil with a deep v2019
CVD method and CVD reactor2015
Method for equipping an epitaxy reactor2014
Gas distributor with pre-chambers arranged in planes2013
Gas inlet element for a CVD reactor2012
Process and apparatus for depositing semiconductor layers using two process gase2010
Inlet system for an MOCVD reactor2009
Method of growing nitrogenous semiconductor crystal materials2009
Device for depositing in particular crystalline layers on one or more, in partic2008
Device for depositing in particular crystalline layers on one or more, in partic2008
Arrangement comprising a support body and a substrate holder which is driven in 2007
Coating method2007