Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for effectively removing polysilicon nodule defects

Method for effectively removing polysilicon nodule defects

US Patent 7449413 · Granted Nov 11, 2008

Estimated economic value: $5,286,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Solar monitoring system for measuring solar radiation intensity2019
Security layer and methods for protecting tenant data in a cloud-mediated comput2018
Intelligent “IoT gateway”2018
Security layer and methods for protecting tenant data in a cloud-mediated comput2017
Methods for forming a memory cell having a top oxide spacer2013
Methods for forming a memory cell having a top oxide spacer2012
Method for decreasing sheet resistivity variations of an interconnect metal laye2008
Method for decreasing sheet resistivity variations of an interconnect metal laye2008
Non-critical complementary masking method for poly-1 definition in flash memory 2007
Non-critical complementary masking method for poly-1 definition in flash memory 2007
Method for controlling poly 1 thickness and uniformity in a memory array fabrica2007
Method for controlling poly 1 thickness and uniformity in a memory array fabrica2007