Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Sputter target based on titanium dioxide

Sputter target based on titanium dioxide

US Patent 7431808 · Granted Oct 7, 2008

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

NiW(X) sputtering target with improved structure2023
Silver alloy-based sputter target2021
Double-layer system comprising a partially absorbing layer, and method and sputt2019
Metal oxide target and method for producing said metal oxide target2019
Zirconium oxide based sputtering target2019
Zirconium oxide based sputtering target2019
Compact systems, compact devices, and methods for sensing luminescent activity2017
Methods for performing embedded wafer-level packaging (eWLP) and eWLP devices, p2016
Photodetector integrated circuit (IC) having a sensor integrated thereon for sen2016
Tube-shaped sputtering target2016
Light-emitting diodes on a wafer-level package2015
Planar or tubular sputtering target and method for the production thereof2015