Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Precursors for chemical vapor deposition

Precursors for chemical vapor deposition

US Patent 7419698 · Granted Sep 2, 2008

Estimated economic value: $31,583,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods of depositing a metal oxide layer or film using a rare earth metal precu2011
Precursors for growth of heterometal-oxide films by MOCVD2002
Chemical vapor deposition precursors2002
Metalorganic chemical vapor deposition precursors2001
Formation of a metalorganic compound for growing epitaxial semiconductor layers1999
Metalorganic compounds1999
Chemical vapor deposition of tin oxide films1998
Preparation of metal alkyls1986
Preparation of adducts1986
Preparation of adducts which may be used in the preparation of compound semicond1984