Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Gas supply method in a CVD coating system for precursors with a low vapor pressure

Gas supply method in a CVD coating system for precursors with a low vapor pressure

US Patent 7413767 · Granted Aug 19, 2008

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Coated glass element2025
Coated glass element2025
Thin glass substrate, method and apparatus for its production2024
Composite glass pane2024
Thin glass substrate, method and apparatus for its production2024
Pharmaceutical packaging with lubricating film and method for producing same2023
Plasma treatment apparatus for producing coatings2023
Thin glass substrate, in particular a borosilicate glass thin glass substrate, m2023
Preparation device, diagnostic apparatus, diagnostic kit and diagnostic system2023
Glass or glass ceramic substrate provided with a decorative coating and method f2023
Plasma treatment apparatus for producing coatings2023
Coated protective glazing2022