Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Self-cleaning colloidal slurry composition and process for finishing a surface of a substrate

Self-cleaning colloidal slurry composition and process for finishing a surface of a substrate

US Patent 7390423 · Granted Jun 24, 2008

Estimated economic value: $7,053,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Chemical-mechanical polishing formulation and methods of use2013
Detection and characterization of SiCOH-based dielectric materials during device2009
Extended life conditioning disk2009
Self-cleaning colloidal slurry composition and process for finishing a surface o2008
Self-cleaning colloidal slurry composition and process for finishing a surface o2008
Self-cleaning colloidal slurry composition and process for finishing a surface o2008
Self-cleaning colloidal slurry composition and process for finishing a surface o2008
Self-cleaning colloidal slurry composition and process for finishing a surface o2008
Self-cleaning colloidal slurry composition and process for finishing a surface o2008
Powder for disks2007
Process for producing glass disk substrates for magnetically recordable data sto2006
Process for producing glass disk substrates for magnetically recordable data sto2006