Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for forming patterns on a semiconductor device using a lift off technique

Method for forming patterns on a semiconductor device using a lift off technique

US Patent 7378690 · Granted May 27, 2008

Estimated economic value: $221,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor apparatus including different thermal resistance values for differ2024
Semiconductor device2024
Semiconductor device2023
Semiconductor device with protective protrusion2023
Semiconductor device2023
Semiconductor device and method of manufacturing the same2023
Power amplifier circuit and semiconductor device2023
Bipolar transistor and method for producing the same2022
Semiconductor device and high-frequency module2022
Semiconductor device2022
Semiconductor device2022
Semiconductor device and method for manufacturing semiconductor device2022