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Home › Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers

Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers

US Patent 7341816 · Granted Mar 11, 2008

Estimated economic value: $9,920,000 ⓘ

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