Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process liquid supply nozzle, process liquid supply device and nozzle cleaning method

Process liquid supply nozzle, process liquid supply device and nozzle cleaning method

US Patent 7326299 · Granted Feb 5, 2008

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Substrate treatment method and substrate treatment system2025
Substrate support member, substrate treatment apparatus, and substrate transfer 2025
Substrate transfer apparatus and substrate transfer method2024
Method for forming insulating film, apparatus for processing substrate, and syst2023
Substrate processing method, substrate processing apparatus, and storage medium2023
Insulating film forming method, insulating film forming device, and substrate pr2023
Computer storage medium to perform a substrate treatment method using a block co2023
Data compression apparatus and data compression method2022
Method for forming insulating film, apparatus for processing substrate, and syst2022
Chemical liquid discharge mechanism, liquid processing apparatus, chemical liqui2020
Facilitation of spin-coat planarization over feature topography during substrate2020
Substrate processing method and computer storage medium2020