Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Polishing pad for semiconductor wafer, polishing multilayered body for semiconductor wafer having same, and method for polishing semiconductor wafer

Polishing pad for semiconductor wafer, polishing multilayered body for semiconductor wafer having same, and method for polishing semiconductor wafer

US Patent 7323415 · Granted Jan 29, 2008

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Microorganism concentrator2019
Electrode material, electrode and electrical storage device2018
Method for examining microorganisms and examination apparatus for microorganisms2018
Sewing machine2018
Method for examining microorganisms2018
Production process for electrode material, electrode and electric storage device2017
Stitchwork status checking system, stitchwork status checking apparatus, stitchw2016
Embroidery cloth presser2016
Imprinter including an elastic member for elastically supporting the roller shaf2015
Stitchwork status checking system, stitchwork status checking apparatus, stitchw2015
Chemical-mechanical polishing pad and chemical-mechanical polishing method2015
Imprinter including a roller with an elastic member being radially deformed duri2013