Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Compositions for chemical mechanical polishing silica and silicon nitride having improved endpoint detection

Compositions for chemical mechanical polishing silica and silicon nitride having improved endpoint detection

US Patent 7297633 · Granted Nov 20, 2007

Estimated economic value: $9,194,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Compositions and methods for delayed crosslinking in hydraulic fracturing fluids2021
Compositions for enhanced oil recovery2020
Surfactant assisted oil recovery using alcohol ether sulfonates and cationic sur2019
Surfactant assisted oil recovery using alcohol ether sulfonates and cationic sur2018
Environmentally beneficial recycling of brines in the process of reducing fricti2016
Controlled geometry composite micro pellets for use in compression molding2015
Controlled geometry composite micro pellets for use in compression molding2014
Method and apparatus for electrochemical planarization of a workpiece2012
System for the preferential removal of silicon oxide2008
Multi-step methods for chemical mechanical polishing silicon dioxide and silicon2007
System for the preferential removal of silicon oxide2007
Compositions for oxide CMP2006