Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Exposing systems providing post exposure baking and related methods

Exposing systems providing post exposure baking and related methods

US Patent 7268853 · Granted Sep 11, 2007

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of manufacturing a rotation-magnetron-in-magnetron (RMIM) electrode2007
Rotation-magnetron-in-magnetron (RMIM) electrode, method of manufacturing the RM2006
High density plasma chemical vapor deposition process2006
Wafer bake system and method for operating the same2006
Method for manufacturing a semiconductor device having hemispherical grains at v2005
Pre-alignment system of exposure apparatus having wafer cooling means and exposu2004
Sputtering apparatus for forming a metal film using a magnetic field2004
Method for forming silicon-oxynitride layer on semiconductor device2004
Method for manufacturing a semiconductor device having hemispherical grains2004
Pre-alignment system of exposure apparatus having wafer cooling means and exposu2003
Method for manufacturing semiconductor device having hemispherical grain polysil2001
Air intake apparatus of chemical vapor deposition equipment and method for remov2000