Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for fabricating field-effect transistor structures with gate electrodes with a metal layer

Method for fabricating field-effect transistor structures with gate electrodes with a metal layer

US Patent 7265007 · Granted Sep 4, 2007

Estimated economic value: $556,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for determining the angular position of the rotor of an inverter-fed sync2025
Method for operating a drive system and drive system for carrying out the method2025
Structural part for lightning strike protection2025
Method for operating a drive train, and drive train2024
Method for monitoring the operation of an electric motor, and lifting mechanism2023
Method for determining the angular position of the rotor of an inverter-fed sync2020
Drive and method2018
Loading arrangement for ships2017
Method for manufacturing a radome2017
Converter for powering electric motor2014
Drive and method2012
Transistor, memory cell, memory cell array and method of forming a memory cell a2010