Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases

Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases

US Patent 7214349 · Granted May 8, 2007

Estimated economic value: $26,598,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Effluent gas stream treatment system having utility for oxidation treatment of s2010
Effluent gas stream treatment system having utility for oxidation treatment of s2010
Effluent gas stream treatment system having utility for oxidation treatment of s2010
Effluent gas stream treatment system having utility for oxidation treatment of s2010
Apparatus and methods of forming a gas cluster ion beam using a low-pressure sou2010
Abatement of effluent from chemical vapor deposition processes using ligand exch2004
Method for point-of-use treatment of effluent gas streams2004
Abatement of effluents from chemical vapor deposition processes using organometa2004
Microwave transparent thermosetting resin compositions, electrical laminates obt2003
Auto-switching gas delivery system utilizing sub-atmospheric pressure gas supply2003
Vinyl-terminated polybutadiene and butadiene-styrene copolymers containing ureth2003
Vinyl-terminated polybutadiene and butadiene-styrene copolymers containing ureth2003