Assignee
Inventors
- Kanwal K. Raina (40 patents)
- David H. Wells (156 patents)
{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Aluminum-containing film derived from using hydrogen and oxygen gas in sputter deposition", "item": "https://www.patentleaderboard.com/patent/7161211"}]}
Skip to contentUS Patent 7161211 · Granted Jan 9, 2007