Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › High density plasma CVD chamber

High density plasma CVD chamber

US Patent 7074298 · Granted Jul 11, 2006

Estimated economic value: $12,872,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Masking member, and method for coating hollow member2025
Electrostatic chuck with improved temperature control2025
Methods and apparatus for processing a substrate2025
Ion beam sputtering with ion assisted deposition for coatings on chamber compone2025
Method for epitaxially depositing a material on a substrate by flowing a process2024
Image recording apparatus with heating of recording medium on which recording ha2024
Current measurement device for measuring currents flowing in mutually opposite d2024
Chamber architecture for epitaxial deposition and advanced epitaxial film applic2024
Gas injector for epitaxy and CVD chamber2024
Faceplate tensioning method and apparatus to prevent droop2024
Power transmission device2024
Seal for an assembly in a vapor deposition chamber2024