Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Siloxane-based resin and a semiconductor interlayer insulating film using the same

Siloxane-based resin and a semiconductor interlayer insulating film using the same

US Patent 7071540 · Granted Jul 4, 2006

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Display device2024
Semiconductor device and method for fabricating the same2024
Semiconductor device and method for fabricating the same2022
Cooling device and method for controlling same2020
Hybrid foundation structure, and method for building same2018
Thin film transistor array panel2018
Thin film transistors, methods of manufacturing thin film transistors, and semic2017
Hybrid foundation structure, and method for building same2017
Contact portion of wire and manufacturing method thereof2016
Methods of forming semiconductor films and methods of manufacturing transistors 2016
Semiconductor materials, transistors including the same, and electronic devices 2016
Solution composition for forming oxide semiconductor, and oxide semiconductor an2016