Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Architectures for high-resolution photomask phase metrology

Architectures for high-resolution photomask phase metrology

US Patent 7042577 · Granted May 9, 2006

Assignee

No assignee recorded.

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

High efficiency stokes-seeding dual-cell raman shifter2005
Apparatus for beam homogenization and speckle reduction2005
Apparatus for beam homogenization and speckle reduction2005
System and method for generating coherent radiation at vacuum ultraviolet wavele2003
System and method for generating coherent radiation at vacuum ultraviolet wavele2003
System and method for generating coherent radiation at ultraviolet wavelengths2002
Method and apparatus for single longitudinal mode operation of pulsed laser osci2001
Method for producing electromagnetically induced transparency in atoms with hype2000
Narrow linewidth BBO optical parametric oscillator utilizing extraordinary reson1997
Narrow linewidth BBO optical parametric oscillator utilizing extraordinary reson1995
Acousto-optical device with lithium tantalate transducer1990
Star catalog navigation system1986