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Home › System and method for using areas near photo global alignment marks or unpatterned areas of a semiconductor wafer to create structures for SIMS or E-Beam or XRD testing

System and method for using areas near photo global alignment marks or unpatterned areas of a semiconductor wafer to create structures for SIMS or E-Beam or XRD testing

US Patent 7038222 · Granted May 2, 2006

Estimated economic value: $13,497,000 ⓘ

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