Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Photoresist formulation for high aspect ratio plating

Photoresist formulation for high aspect ratio plating

US Patent 7005233 · Granted Feb 28, 2006

Estimated economic value: $9,529,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Halite salts as silicon carbide etchants for enhancing CMP material removal rate2018
Elastic encapsulated carbon nanotube based electrical contacts2014
Carbon nanotube columns and methods of making and using carbon nanotube columns 2013
Anchoring carbon nanotube columns2012
Carbon nanotube spring contact structures with mechanical and electrical compone2012
Three dimensional microstructures and methods for making three dimensional micro2010
Photoresist formulation for high aspect ratio plating2009
Photoresist formulation for high aspect ratio plating2007
Simplification of ball attach method using super-saturated fine crystal flux2006
Apparatus and method for cleaning test probes2005
Phase separated system for fluxing2004
Conductive paste and semiconductor component having conductive bumps made from t2003