Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Hydrogen plasma photoresist strip and polymeric residue cleanup process for oxygen-sensitive materials

Hydrogen plasma photoresist strip and polymeric residue cleanup process for oxygen-sensitive materials

US Patent 7001848 · Granted Feb 21, 2006

Estimated economic value: $17,121,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods of forming conductive pipes between neighboring features, and integrated2025
Memory cell formation in three dimensional memory arrays using atomic layer depo2025
Memory array decoding and interconnects2025
Word line structures for three-dimensional memory arrays2025
Sparse piers for three-dimensional memory arrays2025
Dense piers for three-dimensional memory arrays2025
Techniques for forming self-aligned memory structures2025
Access line grain modulation in a memory device2024
Buried lines and related fabrication techniques2024
Cross-point memory array with access lines2024
Methods of forming conductive pipes between neighboring features, and integrated2024
Thin film transistors and related fabrication techniques2024