Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Manufacture method for semiconductor device with patterned film of ZrO2 or the like

Manufacture method for semiconductor device with patterned film of ZrO2 or the like

US Patent 6998303 · Granted Feb 14, 2006

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Abnormality detection system2025
Fabrication method of stacked device and stacked device2025
Semiconductor device and method for manufacturing same2024
Semiconductor device and method for manufacturing same2023
Semiconductor device and control method thereof2022
Semiconductor device2022
Semiconductor device comprising memory semiconductor chip in which memory cell i2022
Semiconductor apparatus including penetration electrodes connecting laminated se2022
Semiconductor apparatus2022
Method of producing semiconductor device2017
Semiconductor device2016
Method for manufacturing semiconductor device and semiconductor device2015