Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Lithographic apparatus, device manufacturing methods, devices manufactured thereby, method of manufacturing a reflector, reflector manufactured thereby and phase shift mask

Lithographic apparatus, device manufacturing methods, devices manufactured thereby, method of manufacturing a reflector, reflector manufactured thereby and phase shift mask

US Patent 6985211 · Granted Jan 10, 2006

Estimated economic value: $3,957,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System lab and standard operating procedure framework2025
Tubular exit device and method of installation2025
Mirror replacement system2025
System and method for efficiently distributing time-sensitive data in bandwidth-2025
Strike assembly for door locking mechanism2024
Generating consolidated visual representations for user journeys via profile tra2024
Strike assembly for door locking mechanism, and method of operation2024
Systems and methods for customer journey orchestration2024
Method for preparing an aqueous dispersion of metal oxide particles2024
Systems and methods for machine learning dataset generation2023
Electric strike installation tool and method2023
Determining suitable values of parameters controlling display characteristics of2023