Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Gas supply system, valve assembly and method of forming reactant pulses by operating a valve assembly

Gas supply system, valve assembly and method of forming reactant pulses by operating a valve assembly

US Patent 6981517 · Granted Jan 3, 2006

Estimated economic value: $3,441,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Thermal-type flow sensor with a thermally conductive frame element in the form o2025
Lightguide2024
Lightguide2024
Flow meter2023
Method for determining a flow rate for a fluid in a flow tube of a flow measurem2020
Ultrasonic flow meter2017
Deposition of TiN films in a batch reactor2011
Chemical vapor deposition of TiN films in a batch reactor2010
Reactor design for reduced particulate generation2008
Method for the heat treatment of substrates2008
Pressure control system2007
Apparatus, method and system for the treatment of a wafer2005