Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Apparatus and methods for patterning a reticle blank by electron-beam inscription with reduced exposure of the reticle blank by backscattered electrons

Apparatus and methods for patterning a reticle blank by electron-beam inscription with reduced exposure of the reticle blank by backscattered electrons

US Patent 6972417 · Granted Dec 6, 2005

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Sensor device2025
Semiconductor device, method for manufacturing semiconductor device, and electro2025
Certificate validation using a multiple-key-pair root certificate authority2025
Battery temperature control device2025
Air conditioner2025
Information processing system, information processing method, and non-transitory2025
Semiconductor device2025
Electrical power transmission to elevator system cars2025
Manufacturing method of butadiene2025
Air conditioner2025
Refrigeration cycle device2025
Dielectric composition and multilayer ceramic electronic component2025