Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for polishing metal and dielectric substrates

Method and apparatus for polishing metal and dielectric substrates

US Patent 6960521 · Granted Nov 1, 2005

Estimated economic value: $24,431,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Conformal yttrium oxide coating2025
Double-sided scrubber for substrate cleaning2025
Polishing pad with secondary window seal2025
Multilayer coatings of component parts for a work piece processing chamber2025
Ex situ coating of chamber components for semiconductor processing2025
Roller for location-specific wafer polishing2025
Multilayer coating for corrosion resistance2025
Ex situ coating of chamber components for semiconductor processing2024
Losartan liquid formulations and methods of use2024
Sterilization and deodorization waste bin with dual-band ultraviolet tube2024
Systems and methods for direct air carbon dioxide capture2024
Post-chemical mechanical polishing brush cleaning box2024