Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Multi-step process for etching photomasks

Multi-step process for etching photomasks

US Patent 6960413 · Granted Nov 1, 2005

Estimated economic value: $24,431,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Air mattresses having internal diagonal support structures2017
Master template replication2015
Critical dimension control during template formation2013
Multi-step process for etching photomasks2008
Multi-step process for etching photomasks2008
Multi-step process for etching photomasks2008
Integrated phase angle and optical critical dimension measurement metrology for 2007
Integrated phase angle and optical critical dimension measurement metrology for 2007
Method and apparatus for etching photomasks2006
Method and apparatus for etching photomasks2006
Methods and apparatus for etching metal layers on substrates2006
Methods and apparatus for etching metal layers on substrates2006