Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Memory element formation with photosensitive polymer dielectric

Memory element formation with photosensitive polymer dielectric

US Patent 6955939 · Granted Oct 18, 2005

Estimated economic value: $5,936,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Charge storage device for detecting alpha particles2014
System and method for detecting particles with a semiconductor device2013
Self aligned memory element and wordline2010
Polymer dielectrics for memory element array interconnect2009
Methods for designing grating structures for use in situ scatterometry to detect2008
Method for semiconductor gate line dimension reduction2007
Self aligned memory element and wordline2007
Method of using carbon spacers for critical dimension (CD) reduction2007
Immersion lithographic process using a conforming immersion medium2006
Patterning with rigid organic under-layer2006
SO2 treatment of oxidized CuO for copper sulfide formation of memory element gro2006
Negative resist or dry develop process for forming middle of line implant layer2006